Festo Introduces the VEFC Mass Flow Controller for Precise Control of Inert Gases
The VEFC setpoint value can be set in milliseconds via analog input. Once the application setpoint is entered, the VEFC mass flow controller automatically maintains it. Setpoints are tamper proof. The flow rate is measured using the differential pressure method.
Since the VEFC continuously monitors flow rate and output pressure, real-time operational data is available via the control system. Thanks to piezoelectric technology, the VEFC is compact and flexible, and offers an excellent price/performance ratio.
The VEFC is designed for use in electronics manufacturing, food production, and anywhere in machine building where inert gas is required. For example, controlling nitrogen is particularly important in the semiconductor industry to maintain silicon wafer quality. With the VEFC installed at load ports, different flow rates via setpoints can be controlled in the individual purge steps – pre-blowing, pre-purge, process purge, and post-purge. Optimum nitrogen utilization conserves energy, which reduces cost and carbon emissions.
For more information on the VEFC mass flow controller, contact a Festo sales representative, Festo distributor, or the company’s website. For more information on the advantages of working within the Festo ecosystem of less engineering overhead, fast time to market, seamless connectivity, and high-quality components, visit www.festo.com.
