© Festo SE & Co. KG
2025/03/12
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カナダ, アメリカ合衆国
New Nitrogen Purging Technology in Semiconductor Fabrication Can Accrue ...
Research conducted by Festo finds a new generation of its low-energy flow-control valves utilized by Front ...
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Research conducted by Festo finds a new generation of its low-energy flow-control valves utilized by Front Opening Unified Pods (FOUPs) purge systems can reduce Nitrogen gas (N2)  consumption by as much as 75%. A new Festo white paper details how these piezo-based flow-control systems help semiconductor fabrication plants (Fabs) reduce their carbon footprint and lower energy costs.
© Festo SE & Co. KG
Festo N2 purge system
When wafers in the semiconductor industry need to be transported and stored, the N2 purge system from Festo saves energy and reduces carbon footprint.
© Festo SE & Co. KG
Festo purge system for wafer production
This Festo VEAD proportional flow-control valve maintains a consistent, low-particle N2 supply.
© Festo SE & Co. KG
2025/03/12
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カナダ, アメリカ合衆国
Festo Takes Pneumatics to a New Level of Performance Through Digital ...
Festo introduces Controlled Pneumatics, a digital closed-loop control strategy for delivering energy ...
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Festo introduces Controlled Pneumatics, a digital closed-loop control strategy for delivering energy efficiency, high dynamic response, and precision movement. Controlled Pneumatics is an ideal solution for web tensioning; welding; surface processing; flexible gripping, including vacuum gripping; dispensing and pumping; PET bottle blowing; and diaphragm pump control.
© Festo SE & Co. KG
Piezoelectric valves
Controlled Pneumatics proportional pressure regulators feature piezoelectric valves, a technology Festo has been applying for decades and now mass produces.