Precise control of inert gases

The mass flow controller VEFC from Festo is one of the most compact on the market, while capable of a flow rate of 200 l/min. Thanks to digitalization, the flow rate remains constant. This means that this dynamic, directly controlled piezo valve for inert gases doesn't have to be adjusted manually. It only takes milliseconds to precisely adjust the flow rates and their settings, and they remain tamper-proof. This provides users with the flexibility they need for their production processes. In addition, the VEFC allows them to continuously monitor processes since the flow rate and output pressure are always transparent.

Reliable protection of wafers

Reliably controlling the flow of inert gases such as nitrogen is particularly important in the semicon industry in order to avoid damaging wafers. By focusing on inert gases without media separation, the VEFC proves to be a favorable alternative to other solutions on the market when controlling nitrogen in load ports or EFEMs.

Economical, reliable, and precise N2 purging

Different flow rates can be controlled in the individual purge steps by having VEFC in the load port. It ensures that only the absolutely necessary amount of nitrogen is used, whether during pre-blowing, pre-purge, process purge and post-purge. Users thus save nitrogen and shorten the processing time until the dry shielding gas atmosphere has been reached.